发明名称 TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.
申请公布号 US2010075443(A1) 申请公布日期 2010.03.25
申请号 US20090553906 申请日期 2009.09.03
申请人 YONEDA IKUO;NAKASUGI TETSURO;ITOH MASAMITSU;INANAMI RYOICHI 发明人 YONEDA IKUO;NAKASUGI TETSURO;ITOH MASAMITSU;INANAMI RYOICHI
分类号 H01L21/66;G06K9/00 主分类号 H01L21/66
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