| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition capable of achieving large depth of focus, small LWR and MEEF, excellent characteristic for preventing the occurrence of pattern collapse, and excellent performance for preventing the occurrence of defect in development. <P>SOLUTION: This radiation sensitive resin composition contains a resin (A), a radiation sensitive acid generator (B), an acid diffusion inhibitor (C), and a solvent (D). The resin (A) is a polymer having a repeating unit (a-1) having a cyclic carbonic ester structure on a side chain. The acid diffusion inhibitor (C) is a nitrogen-containing compound having a specific structure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
