| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an etching method of a zinc oxide-based material, which can evenly etch the zinc oxide-based material without generating etching residues. <P>SOLUTION: The etching method includes a first process (S1) for etching the zinc oxide-based material by a solution containing oxalic acid and a second process (S2) for removing etching residues generated in the first process by using an alkaline solution. The etching method presents an effect capable of evenly etching the zinc oxide-based material, especially a zinc oxide-based material having a (000-1) crystal surface, without generating etching residues. <P>COPYRIGHT: (C)2010,JPO&INPIT |
