发明名称 PLASMA TREATING METHOD AND APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma treating method and apparatus assuring stability of treatment by suppressing fluctuation in recovery rate or recovery concentration of fluorine raw material in atmospheric plasma treatment. Ž<P>SOLUTION: Exhaust gas output from an atmospheric plasma treatment part 2 to an exhaust line 30 is separated into recovery gas to a recovery line 50 and release gas to a release line 60 by a separation membrane 41 of a separation part 40. The recovery gas is used as at least a part of process gas. Upon the separation, physical quantities (preferably pressures) of at least two gases among the recovery gas, release gas and exhaust gas related to the separation are adjusted in accordance with a flow rate of the process gas such that either one or both of the recovery rate and recovery concentration of the fluorine raw material become desired amounts. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010063995(A) 申请公布日期 2010.03.25
申请号 JP20080232121 申请日期 2008.09.10
申请人 SEKISUI CHEM CO LTD 发明人 MAYUMI SATOSHI;KUNUGI SHUNSUKE;SATO TAKASHI;UMEOKA TAKASHI
分类号 B01J19/08;B01D53/22;H01L21/3065 主分类号 B01J19/08
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