| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an object support positioning device for lithographic apparatus which has such a bearing as to be able to deal with a relatively large force and/or torque without requiring the alteration of the external size of X-beam preferably. <P>SOLUTION: With respect to the object support positioning device 1 for positioning an object support, a fluid bearing is provided in at least one slider of first, second, and third sliders. The fluid bearing includes a plurality of bearing surfaces for applying a reaction force in a first direction vertical to the sliding direction of at least one of the sliders. <P>COPYRIGHT: (C)2010,JPO&INPIT |
