| 摘要 |
PURPOSE: A film deposition device, a film deposition method, and a computer readable storage medium are provided to reduce a process time by including an exhaust unit. CONSTITUTION: A film deposition device(10) includes a reactive container(20), a substrate holder, a first reactive gas supply unit, a second reactive gas supply unit, a separation gas supply unit, and an exhaust unit. The substrate holder is installed inside the reactive container and holds the substrate. The first reactive gas supply unit flows a first reactive gas to the center of the substrate holder. The second reactive gas supply unit flows a second reactive gas to the center of the substrate holder. A separation gas supply unit is installed between the first and second gas supply units. The separation gas supply unit flows the separation gas to the center of the substrate holder. The exhausting unit is installed in the center of the substrate holder and exhausts a reactive gas and a separation gas.
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