发明名称 SUBSTRATE PROCESSING DEVICE
摘要 <p>A substrate processing device enables solution to the problem that the movement of each part during maintenance cannot be specified through an operation screen. The device is adaptable to even a command which the maintenance worker judges to be required without modifying the program. The device composed of a plurality of parts includes an operating means (19) having an operation screen for commanding each part to move variously or setting a movement, a first control means (20) for receiving the command to perform a predetermined processing of a substrate or preset information given through the operation screen, and a second control means (21) for making a control to perform a predetermined processing of the substrate according to the command or the preset information transmitted from the first control means (20). The operating means (19) sends to the first control means (20) information including the contents preset through the screen according to the parameter specifying a movement of each part during maintenance when a means for determining the setting of the movement of each part during maintenance through the screen for setting the movement is pressed.</p>
申请公布号 WO2010032499(A1) 申请公布日期 2010.03.25
申请号 WO2009JP54141 申请日期 2009.03.05
申请人 HITACHI KOKUSAI ELECTRIC INC.;SUEYOSHI, MASAKO 发明人 SUEYOSHI, MASAKO
分类号 H01L21/205;H01L21/02 主分类号 H01L21/205
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