VIBRATION DAMPING IN PROJECTION EXPOSURE APPARATUSES FOR SEMICONDUCTOR LITHOGRAPHY

摘要

The invention relates to a changeable assembly (1) for a projection exposure apparatus for semiconductor lithography (310), which contains at least one damping element (2). Furthermore, the invention relates to a projection exposure apparatus for semiconductor lithography (310) and to a measuring assembly for a projection exposure apparatus for semiconductor lithography comprising at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus (310).