发明名称 METHODS FOR ELECTRON-BEAM INDUCED DEPOSITION OF MATERIAL INSIDE ENERGETIC-BEAM MICROSCOPES
摘要 We disclose methods for materials deposition on a surface (120) inside an energetic-beam instrument, where the energetic-beam instrument is provided with a laser beam (170), an electron beam (100), and a source (130) of precursor gas (150). The electron beam (100) is focused on the surface (120), and the laser beam (170) is focused to a focal point (190) that is at a distance (200) above the surface (120) of about 5 microns to one mm, preferably from 5 to 50 microns. The focal point (190) of the laser beam (170) will thus be within the stream of precursor gas (150) injected at the sample surface (120), so that the laser beam (170) will facilitate reactions in this gas cloud with less heating of the surface (120).
申请公布号 WO2010033420(A2) 申请公布日期 2010.03.25
申请号 WO2009US56492 申请日期 2009.09.10
申请人 OMNIPROBE, INC.;ZAYKOVA-FELDMAN, LYUDMILA;KRUGER, ROCKY;MARCHMAN, HERSCHEL;MOORE, THOMAS 发明人 ZAYKOVA-FELDMAN, LYUDMILA;KRUGER, ROCKY;MARCHMAN, HERSCHEL;MOORE, THOMAS
分类号 H01L21/205 主分类号 H01L21/205
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