PHOTOCURABLE COMPOSITION AND PROCESS FOR PRODUCING MOLDED OBJECT HAVING FINE PATTERN IN SURFACE

摘要

A photocurable composition which can give a cured object excellent in releasability and mechanical strength; and a process for producing a molding with excellent durability which has, in a surface thereof, a fine pattern which is a precisely transferred pattern reverse to the pattern of a mold. The photocurable composition (20) comprises: 15-60 mass% compound (A) which is either an aromatic compound having two or more rings or an alicyclic compound having two or more rings and has two (meth)acryloyloxy groups; 5-40 mass% compound (B) having a fluorine atom and one or more carbon-carbon unsaturated double bonds (provided that the compound (A) is excluded); 10-55 mass% compound (C) having one (meth)acryloyloxy group (provided that the compound (B) is excluded); and 1-12 mass% photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass%).