发明名称 ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION
摘要 <p>A deflection component (236) suitable for use in an ion implantation system comprises multiple electrodes (236a, 236b) that can be selectively biased to cause an ion beam (124) passing therethrough to bend, deflect, focus, converge, diverge, accelerate, decelerate, and/or decontaminate. Since the electrodes can be selectively biased, and thus one or more of them can remain unbiased or off, the effective length of the beam path can be selectively adjusted as desired (e.g., based upon beam properties, such as energy, dose, species, etc. ).</p>
申请公布号 WO2010033199(A1) 申请公布日期 2010.03.25
申请号 WO2009US05182 申请日期 2009.09.17
申请人 AXCELIS TECHNOLOGIES INC.;GRAF, MIKE;EISNER, EDWARD;VANDERBERG, BO 发明人 GRAF, MIKE;EISNER, EDWARD;VANDERBERG, BO
分类号 H01J37/317;H01J37/147 主分类号 H01J37/317
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