DEACTIVATION RESISTANT PHOTOCATALYST AND METHOD OF PREPARATION

摘要

A photocatalyst formed using a sol-gel process provides high photo activity, increased photocatalyst lifetime, and improved resistance to performance degradation caused by siloxane-based contaminants. The photocatalyst comprises particles of photocatalytically-active oxide having a surface area of greater than about 190 m2/cm3 of skeletal volume and having pores with a diameter of about 4 nm or greater. The particles are made up of wide band gap semiconductor crystallites that have a diameter of greater than about 2 nm.