发明名称 |
LITHOGRAPHIC SYSTEM, LITHOGRAPHIC METHOD AND DEVICE MANUFACTURING METHOD. |
摘要 |
A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus. |
申请公布号 |
NL2003497(A) |
申请公布日期 |
2010.03.24 |
申请号 |
NL20092003497 |
申请日期 |
2009.09.15 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
MOS, EVERHARDUS;SCHAAR, MAURITS;MIDDLEBROOKS, SCOTT |
分类号 |
G01N21/47;G03F7/20 |
主分类号 |
G01N21/47 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|