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经营范围
发明名称
Photo-sensitive material having a shallow layer containing a benzenediazo sulfonic acid compound or salts thereof
摘要
申请公布号
US3385705(A)
申请公布日期
1968.05.28
申请号
US19640399326
申请日期
1964.09.25
申请人
NORTH AMERICAN PHILIPS COMPANY, INC.
发明人
DIPPEL CORNELIS JOHANNES;HOUTMAN HARKE JAN;JONKER HENDRIK
分类号
G03C1/62
主分类号
G03C1/62
代理机构
代理人
主权项
地址
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