Electron beam vapor deposition apparatus and method

摘要

An electron beam vapor deposition apparatus (10) includes a coating chamber (12) having a first chamber section (14) with a first coating zone (18a) for depositing a first coating and a second chamber section (16) with a second coating zone (18b) for depositing a second coating. At least one electron beam source (20a,20b,22a,22b) is associated with the first chamber section (14) and the second chamber section (16). A first crucible (30a) is adjacent to the first coating zone (18a) for presenting a first source coating material (32a), and a second crucible (30b) is adjacent to the second coating zone (18b) for presenting a second source coating material (32b). A transport (40) is operative to move a work piece between the first coating zone (18a) of the first chamber section (14) and the second coating zone (18b) of the second chamber section (16).