发明名称 Microfabrication using patterned topography and self-assembled monolayers
摘要 A method of selectively and electrolessly depositing a metal onto a substrate having a metallic microstructured surface is disclosed. The method includes forming a self-assembled monolayer on the metallic microstructured surface, exposing the self-assembled monolayer to an electroless plating solution including a soluble form of a deposit metal, and depositing electrolessly the deposit metal selectively on the metallic microstructured surface. Articles formed from this method are also disclosed.
申请公布号 US7682703(B2) 申请公布日期 2010.03.23
申请号 US20060564582 申请日期 2006.11.29
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 FREY MATTHEW H.;NGUYEN KHANH P.
分类号 B32B27/00;B29D7/00 主分类号 B32B27/00
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