发明名称 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
摘要 The composition for forming silica based coating of the invention comprises siloxane resin such as an alkoxysilane as component (a), a solvent such as an alcohol capable of dissolving the siloxane resin as component (b), an ammonium salt, etc. as component (c) and a thermal decomposing/volatile compound as component (d), wherein the stress of the coating obtained by heat treatment at 150° C./3 min is 10 MPa and the specific permittivity of the silica based coating obtained by final curing is less than 3.0. The composition for forming silica based coating according to the invention can form a silica based coating having low permittivity, excellent adhesion and sufficient mechanical strength.
申请公布号 US7682701(B2) 申请公布日期 2010.03.23
申请号 US20050040119 申请日期 2005.01.24
申请人 HITACHI CHEMICAL CO., LTD. 发明人 SAKURAI HARUAKI;ABE KOICHI;ENOMOTO KAZUHIRO;NOBE SHIGERU
分类号 B32B9/04;B05D3/02;C08G77/08;C08K3/34;C09D183/02;C09D183/04;H01L23/532 主分类号 B32B9/04
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