发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.
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申请公布号 |
US7684013(B2) |
申请公布日期 |
2010.03.23 |
申请号 |
US20060436058 |
申请日期 |
2006.05.18 |
申请人 |
ASML NETHERLANDS B.V.;CARL ZEISS SMT AG |
发明人 |
HANSEN STEVEN GEORGE;FLAGELLO DONIS GEORGE;SINGER WOLFGANG;GEH BERND PETER;BLAHNIK VLADAN |
分类号 |
G03B27/54;G03B27/72 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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