发明名称 Semiconductor device
摘要 A semiconductor device has an active layer, a first semiconductor layer of first conductive type, an overflow prevention layer disposed between the active layer and the first semiconductor layer, which is doped with impurities of first conductive type and which prevents overflow of electrons or holes, a second semiconductor layer of first conductive type disposed at least one of between the active layer and the overflow prevention layer and between the overflow prevention layer and the first semiconductor layer, and an impurity diffusion prevention layer disposed between the first semiconductor layer and the active layer, which has a band gap smaller than those of the overflow prevention layer, the first semiconductor layer and the second semiconductor layer and which prevents diffusion of impurities of first conductive type.
申请公布号 US7683390(B2) 申请公布日期 2010.03.23
申请号 US20080036409 申请日期 2008.02.25
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TACHIBANA KOICHI;HONGO CHIE;NAGO HAJIME;NUNOUE SHINYA
分类号 H01L29/22;H01S5/343 主分类号 H01L29/22
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