发明名称 Test structure for electromigration analysis and related method
摘要 A test structure for electromigration and related method are disclosed. The test structure may include an array of a plurality of multilink test sets, each multilink test set including a plurality of metal lines positioned within a dielectric material and connected in a serial configuration; each multilink test set being connected in a parallel configuration with the other multilink test sets, the parallel configuration including a first electrical connection to a cathode end of a first metal line in each multilink test set and a second electrical connection to an anode end of a last metal line in each multilink test set.
申请公布号 US7683651(B2) 申请公布日期 2010.03.23
申请号 US20090348434 申请日期 2009.01.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHANDA KAUSHIK;FILIPPI RONALD G.;WANG PING-CHUAN
分类号 G01R31/26;G01R19/00;H01L23/58 主分类号 G01R31/26
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