发明名称 |
Partial block polyimide-polysiloxane copolymer, making method, and resin composition comprising the copolymer |
摘要 |
A partial block polyimide-polysiloxane copolymer is provided comprising repeat unit structures having structural formulae (1) and (2) wherein X is an aromatic or aliphatic ring-containing tetravalent organic radical, Y1 is a diamine residue, Y2 is a diaminosiloxane residue, Y1 and Y2 are contained in the copolymer in amounts of 99-20 mol % and 1-80 mol %, respectively, L and m each are an integer of 2-50. The copolymer has good adhesion to substrates, moisture-proof reliability and a low modulus of elasticity.
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申请公布号 |
US7683152(B2) |
申请公布日期 |
2010.03.23 |
申请号 |
US20050131197 |
申请日期 |
2005.05.18 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
AKIBA HIDEKI;ICHIROKU NOBUHIRO;SHIOBARA TOSHIO |
分类号 |
C08G77/24;C08L63/00;C08G59/62;C08G73/10;C08G77/04;C08G77/455;C08L79/08 |
主分类号 |
C08G77/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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