发明名称 Partial block polyimide-polysiloxane copolymer, making method, and resin composition comprising the copolymer
摘要 A partial block polyimide-polysiloxane copolymer is provided comprising repeat unit structures having structural formulae (1) and (2) wherein X is an aromatic or aliphatic ring-containing tetravalent organic radical, Y1 is a diamine residue, Y2 is a diaminosiloxane residue, Y1 and Y2 are contained in the copolymer in amounts of 99-20 mol % and 1-80 mol %, respectively, L and m each are an integer of 2-50. The copolymer has good adhesion to substrates, moisture-proof reliability and a low modulus of elasticity.
申请公布号 US7683152(B2) 申请公布日期 2010.03.23
申请号 US20050131197 申请日期 2005.05.18
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 AKIBA HIDEKI;ICHIROKU NOBUHIRO;SHIOBARA TOSHIO
分类号 C08G77/24;C08L63/00;C08G59/62;C08G73/10;C08G77/04;C08G77/455;C08L79/08 主分类号 C08G77/24
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