发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is presented. The lithographic apparatus includes a beam splitter configured to split a radiation beam into a plurality of radiation beams; a substrate stage configured to support a substrate; a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on the substrate; and a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is output by the radiation source.
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申请公布号 |
US7684014(B2) |
申请公布日期 |
2010.03.23 |
申请号 |
US20060607100 |
申请日期 |
2006.12.01 |
申请人 |
ASML HOLDING B.V. |
发明人 |
SEWELL HARRY;MCCAFFERTY DIANE;MARKOYA LOUIS JOHN |
分类号 |
G03B27/54;G03B27/32;G03B27/42;G03B27/72 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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