NANOIMPRINT LITHOGRAPHY METHOD

摘要

FIELD: physics. ^ SUBSTANCE: invention relates to microelectronics and can be used in nanoimprint lithography when making ordered arrays of magnetic and other structures. The method involves formation of a relief on a resist coating deposited on a substrate via nanoimprint lithography with application of exciting ultrasonic oscillations and an axial force onto a die. Ultrasonic oscillations arising when the die gets into contact with the resist are also detected in the substrate, from the intensity and/or phase and/or spectrum from which the degree of filling the die relief with the resist is determined. ^ EFFECT: invention enables monitoring formation of a relief without restrictions on optical properties of substrates. ^ 7 cl, 1 dwg