| 摘要 |
FIELD: process engineering. ^ SUBSTANCE: invention relates to devices that generate plasma jet temperature exceeding 30000 K and can be used, primarily, for fast metal cutting. Proposed plasmatron incorporates fixed rod-type electrode 1, electrode chamber 2 with tangential orifices 3 and refrigerator chamber 4 with water feed opening 5 and water discharge opening 6. It comprises also gas ejector channel 7 with its inner 8 and outer 9 walls forming channel 10 of water-dispersion cooling with circular collector 11 and circular guides 12. ^ EFFECT: higher efficiency of cooling, longer lifer and lower hydraulic losses. ^ 2 dwg |
