| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of decomposing a nitrogen trifluoride which can easily treat a product in order to make an exhaust gas harmless, as well as a device for decomposing the nitrogen trifluoride. <P>SOLUTION: The decomposition device 20 decomposes NF<SB>3</SB>through a connection with an exhaust gas system e.g. a CVD device for discharging an exhaust gas containing NF<SB>3</SB>. In addition, the device includes: a reaction chamber 22; a plasma generation chamber 25 which receives a reaction gas including a gas molecule containing a hydrogen atom, and connects with the side part of the reaction chamber 22 downstream; and a plasma source 27 which turns the gas molecule to a plasma state in the plasma generation chamber 25. In the plasma generation chamber 25, the gas molecule is turned into a plasma state, whereby the hydrogen atom contained in the gas molecule is dissociated into a hydrogen active species H<SP>*</SP>. Further, in the reaction chamber 22, NF<SB>3</SB>supplied from the CVD device reacts with the hydrogen active species H<SP>*</SP>flowing into the reaction chamber 22 from the plasma generation chamber 25, as shown by the chemical equation: (NF<SB>3</SB>+6H<SP>*</SP>→NH<SB>3</SB>+3HF), and then is decomposed into NH<SB>3</SB>and HF. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
