发明名称 |
CHARGED PARTICLE-BEAM APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle-beam apparatus to independently control a probe current and an objective aperture angle, for the purpose of setting a desired probe current value and the objective opening angle in accordance with the radius of an objective aperture. SOLUTION: The charged particle-beam apparatus is formed of a structure having the objective aperture 6 between capacitor lenses 4, 7. The controlling value of a first capacitor-lens controller 60 is processed to set the desired probe current value in accordance with the radius of the objective aperture 6. The controlling value of a second capacitor-lens controller 62 is processed to set the desired objective opening angle in accordance with the radius of the objective aperture 6 and the controlling value of the capacitor-lens controller 60. The processed controlling value is set to the second capacitor-lens 62 to control the objective opening angle 43. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010062088(A) |
申请公布日期 |
2010.03.18 |
申请号 |
JP20080228609 |
申请日期 |
2008.09.05 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
SHOJO TOMOYASU;FUKUDA MUNEYUKI;SUZUKI NAOMASA;TAKAHASHI NORIJI |
分类号 |
H01J37/28;H01J37/04;H01J37/10 |
主分类号 |
H01J37/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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