发明名称 IMPROVED WIRE GRID SUBSTRATE STRUCTURE AND METHOD FOR MANUFACTURING SUCH A SUBSTRATE
摘要 <p>The present invention relates to a multi-layered substrate structure comprising at least one carrier layer (11),a first layer (12), said carrier layer and first layer being in contact with each other, and at least one second layer with a chemical composition different from the first layer(13) said first and second layer being in contact with each other, the second layer forming apertures each having at least one in-plane dimension (W1) smaller than the diffraction limit, the diffraction limit being defined by a radiation wavelength of the excitation light. The invention further relates to the use and manufacturing process of such a substrate structure and a luminescence sensor.</p>
申请公布号 WO2010029498(A1) 申请公布日期 2010.03.18
申请号 WO2009IB53916 申请日期 2009.09.08
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V.;KAHYA, NERIMAN, N.;KLUNDER, DERK, J., W. 发明人 KAHYA, NERIMAN, N.;KLUNDER, DERK, J., W.
分类号 G01N21/55;G01N21/64;G01N33/551;G01N33/58 主分类号 G01N21/55
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