| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a patterning method, capable of enlargement and detailed fine patterning, without causing degradation of the thin-film characteristics of an organic EL material, or the like, as well as, to provide a manufacturing method of a device which uses the patterning method. Ž<P>SOLUTION: In the patterning method, a photothermal conversion layer and a partition pattern are formed on a substrate, donor substrates with imprint materials of the "k" number in a lateral direction and the "l" number in a vertical direction (k, l are integers of 1 or more) arrayed in the partition pattern are arranged in opposition with a device substrate, the imprint materials are imprinted on the device substrate in a block by irradiating light in an area wider than in a region which consists of imprinting materials with the "m" number in the lateral direction and the "n" number in the vertical direction (k≥m≥1, l≥n≥1) onto the photothermal conversion layer. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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