DECOMPOSITION TREATMENT METHOD, DECOMPOSITION TREATMENT AGENT, AND DECOMPOSITION TREATMENT DEVICE OF FLUORIDE GAS

摘要

PROBLEM TO BE SOLVED: To provide a decomposition treatment method and device of a fluoride gas, which can lower a decomposition treatment temperature of the fluoride gas.

SOLUTION: A reaction chamber 14 in which a decomposition treatment agent A consisting of calcium oxide, silicon, and an alkali metal halide is chambered is provided in a reaction container 10. A gas to be treated containing fluoride is supplied to the reaction chamber 14 and at the same time the fluoride is treated by decomposition on heating the reaction chamber to a predetermined temperature by an electric furnace 17 installed around the reaction container to discharge a treated gas.

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