| 摘要 |
<P>PROBLEM TO BE SOLVED: To surely perform the suppression of an increase in the size of a liquid treatment apparatus, the improvement of nozzle cleaning efficiency and the dry prevention of a treatment liquid. Ž<P>SOLUTION: The liquid treatment apparatus includes: a cleaning chamber 62 having a funnel 65, a first solvent supply means 71 for supplying a solvent to the funnel of the cleaning chamber; a second solvent supply means 72 for supplying the solvent to the upper side of the funnel in the cleaning chamber 62; a nozzle suction means; moving means 44, 46 for moving the nozzle between the cleaning chamber and a position on which a treatment liquid is discharged to a substrate; and a controller 100 for controlling the first and second solvent supply means 71, 72, the suction means and the moving means 44, 46. When the nozzle is stored in a cleaning chamber 62, the liquid surface of the treatment liquid in the nozzle is retreated by the suction means, the solvent is supplied from the first solvent supply means 71 into the cleaning chamber 62, an eddy current of the solvent is formed to clean the nozzle, the solvent is supplied from the second solvent supply means 72 into the cleaning chamber 62 to form a liquid pool of the solvent in the cleaning chamber 62, and the nozzle is sucked by the suction means to form a treatment liquid layer, an air layer and a solvent layer of the treatment liquid in the inside of a tip of the nozzle. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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