| 摘要 |
An etchant for titanium-based metals, tungsten-based metals, titanium-tungsten-based metals or nitrides of those metals, which contains hydrogen peroxide, an organic acid salt and water. The etchant enables uniform etching of titanium-based metals, tungsten-based metals, titanium-tungsten-based metals or nitrides of those metals, while suppressing foaming, and has excellent etching selectivity to substrate materials and metals other than titanium-based metals, tungsten-based metals and titanium-tungsten-based metals. |
