发明名称 LIGHTING DEVICE FOR INSPECTION AND INSPECTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a lighting device for inspection capable of detecting an electrode on a silicon wafer and a metal on a metal using a difference between scattering rates of targeted materials, where it is difficult to detect the difference between the targeted materials, and an inspection method therefor. SOLUTION: The lighting device for inspection to inspect an object 1 to be inspected having an object body 11 to be inspected of a metal or a semimetal and a metal particle assembly 12 formed on the surface of the object body 11 or separately from the object body, includes an optical irradiation section 2 for irradiating the surface of the object body 11 to be inspected and the metal particle assembly 12 with light so as to polarize the reflected light r of light i entering in the object body 11 to be inspected in a specific direction and a polarization element 3 for cutting off the light polarized in the specific direction, in which the object body to be inspected or the metal particle assembly is inspected by the light transmitted through the polarization element. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010060415(A) 申请公布日期 2010.03.18
申请号 JP20080225974 申请日期 2008.09.03
申请人 CCS INC 发明人 YONEDA KENJI;MASUMURA SHIGEKI;MIURA KENJI;OSAWA TAKASHI
分类号 G01N21/84;G01N21/88 主分类号 G01N21/84
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