POLYMERIZABLE MONOMER COMPOUND, PATTERNING METHOD, AND RESIST COMPOSITION USED IN THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polymerizable monomer compound effective as a raw material for preparation of a base polymer of a resist material.

SOLUTION: A patterning method includes steps of: applying a positive resist material on a substrate to form a resist film, the resist material containing a polymer compound having a repeating unit having a substituted or unsubstituted hydroxyalkylnaphthalene and a repeating unit becoming soluble in an alkali by the action of an acid; heat treating the resist film and exposing the film to high-energy rays; heat treating the exposed film and developing the resist film with a developer; and causing the resist film to crosslink and cure with the aid of heat or of acid and heat.

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