| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-speed and accurate method that, in order to maintain consistent results of a plasma processing chamber, by confirming correct assembly of the chamber and hardware parts, and troubleshooting and repairing the chamber and the plasma processing system. <P>SOLUTION: The method is for examining a plasma processing system having a chamber, an RF (radio frequency) power supply, and a matching network. The RF power signal is generated in the chamber from the RF power supply without igniting plasma inside the chamber. The voltage, current, and phase of the RF power signal received in the chamber are measured, and other parameters affecting the chamber factors are simultaneously maintained. A value showing the impedance of the chamber is calculated based on the voltage, current, and phase. After that, the value is compared with a reference value to determine a defect in the plasma processing system. The reference value shows the impedance of the defect-free chamber. <P>COPYRIGHT: (C)2010,JPO&INPIT |
