发明名称 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 A measurement apparatus comprises a mirror configured to reflect test light which passes through an optical system, an interferometer unit which includes an image sensor and is configured to form an interference fringe on an image sensing plane of the image sensor by reference light and the test light reflected by the mirror, and a controller configured to control the interferometer unit, and to compute a numerical aperture of the optical system based on the interference fringe captured by the image sensor, wherein the controller is configured to compute a numerical aperture NA of the optical system by multiplying a quotient &Dgr;NA/&Dgr;R, describing a change &Dgr;NA in numerical aperture NA of the optical system with respect to a change &Dgr;R in pupil radius R of the optical system in the image sensing plane, by the pupil radius R of the optical system in the image sensing plane.
申请公布号 US2010068634(A1) 申请公布日期 2010.03.18
申请号 US20090560024 申请日期 2009.09.15
申请人 CANON KABUSHIKI KAISHA 发明人 SUZUKI TAKESHI;KURAMOTO YOSHIYUKI
分类号 G03F7/20;G01B9/02;G03B27/54 主分类号 G03F7/20
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