发明名称 PELLICLE FRAME, PELLICLE AND METHOD FOR USING PELLICLE FRAME
摘要 <p>Provided is a pellicle frame wherein the frame is not distorted when a pellicle film is stretched and pasted, and the pellicle frame itself follows up flexure caused by the weight of a mask even after a pellicle is pasted to the mask. A rectangular pellicle frame has a distortion factor a of 0.06% or less, the followability ß of each side of the pellicle frame expressed by the general expression (1) is 3 mm or more, the followability ß of the long side of the pellicle frame is 32 mm or less, the long side of the pellicle frame has a length of 1400-2100 mm, and the area on the inside of the pellicle frame is 15000 cm2 or more.   ß=(1/flexure of pellicle)×thickness×width    (1)</p>
申请公布号 WO2010029997(A1) 申请公布日期 2010.03.18
申请号 WO2009JP65919 申请日期 2009.09.11
申请人 ASAHI KASEI E-MATERIALS CORPORATION;KITAJIMA, SHINTARO;KURIYAMA, HOZUMA 发明人 KITAJIMA, SHINTARO;KURIYAMA, HOZUMA
分类号 G03F1/64 主分类号 G03F1/64
代理机构 代理人
主权项
地址