发明名称 |
FOTORESISTZUSAMMENSETZUNG, DIE EIN AUFLÖSUNGSMODIFIKATIONSMITTEL MIT NIEDRIGER AKTIVIERUNGSENERGIE ENTHÄLT |
摘要 |
A dissolution modification agent suitable for use in a photoresist composition including a polymer, a photoacid generator and casting solvent. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups. |
申请公布号 |
DE602006012076(D1) |
申请公布日期 |
2010.03.18 |
申请号 |
DE20066012076T |
申请日期 |
2006.08.21 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORP. |
发明人 |
ALLEN, ROBERT DAVID;DIPIETRO, RICHARD ANTHONY;TRUONG, HOA;BROCK, PHILLIP JOE;SOORIYAKUMARAN, RATNAM |
分类号 |
G03F7/004;C07J9/00;C07J17/00;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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