METHOD FOR CONTROLLING PROCESS GAS CONCENTRATION

摘要

The invention relates to a method for controlling the process gas concentration for the treatment of substrates in a process chamber, wherein a liquid is evaporated in a bubbler by means of the bubbles of a carrier gas that are guided through. The aim of the invention is to create a method for controlling the process gas concentration that is easy to implement. Said aim is achieved by the production of a predetermined constant interior pressure within the bubbler, and subsequent introduction of a carrier gas into the bubbler while at the same time controlling the temperature of the medium to be evaporated within the bubbler in order to set a predetermined vapor pressure.