发明名称 EXPOSURE DEVICE, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device that suppresses occurrence of an exposure defect. <P>SOLUTION: The exposure device includes a first movable member which is movable in a predetermined plane including a first position irradiated with exposure light, while holding a substrate, a measurement system including an encoder head disposed at the first movable member, and measuring position information on the first movable member, and a holding device for holding a scale unit including a scale plate in a releasable state at a position where it can face the encoder unit. The holding device has a support member for supporting the scale unit slidably in a direction substantially parallel with the predetermined plane. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010062209(A) 申请公布日期 2010.03.18
申请号 JP20080223786 申请日期 2008.09.01
申请人 NIKON CORP 发明人 KIUCHI TORU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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