| 摘要 |
Deposits adhered on the inner surface of a processing chamber or the like of an evaporating apparatus can be removed without having to open the processing chamber. Disclosed is an evaporating apparatus for performing a film forming process on a target object to be processed by vapor deposition, the apparatus including: an evaporating head for supplying vapor of a film forming material to the target object; vapor generating units for vaporizing the film forming material; a cleaning gas generating unit for generating a cleaning gas; vapor supply pipes for supplying the vapor of the film forming material to the evaporating head from the vapor generating units; and a cleaning gas supply pipe for supplying the cleaning gas to the evaporating head from the cleaning gas generating unit, wherein opening/closing valves are installed on the vapor supply pipes and the cleaning gas supply pipe.
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