| 发明名称 |
Verfahren zur Belichtung eines Substrats mit einem Strahl |
| 摘要 |
A method is disclosed in which the speed of the substrate carrier system 50 is changed during exposure depending on the exposure pattern density. The substrate carrier system 50 defines a track curve 60 , whereby the exposure pattern is exposed within a band (62<SUB>1</SUB>, 62<SUB>2</SUB>, . . . 62<SUB>3</SUB>) around the track curve. |
| 申请公布号 |
DE102004058967(B4) |
申请公布日期 |
2010.03.18 |
| 申请号 |
DE20041058967 |
申请日期 |
2004.12.08 |
| 申请人 |
VISTEC ELECTRON BEAM GMBH |
发明人 |
GAUGLITZ, HEIKE;GEHRE, MICHAEL;HAHMANN, PETER;HOPP, MICHAEL;MELZER, DETLEF |
| 分类号 |
G03F7/20;G03F1/78;G03F7/23 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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