FILM TYPE MULTI-LAYER PHOTOSENSITIVE MATERIALS

摘要

PURPOSE: A film type multilayered photosensitive material is provided to implement height step and three dimensional micro circuit patterns using one film type transfer material. CONSTITUTION: A film type multilayered photosensitive material comprises two photoresist layers and an alkaline development light barrier layer formed between the photoresist layers. The two photoresist layers are the same and different and are selected from a photocrosslinkable layer and a photodegradable photoresist layer. The alkaline development light barrier layer has light transmission of 5% or less at 200~400nm wavelength range.