| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To make the film thickness of a semi-transmissive film in a semi-transmissive part constant and to make change of the tone in a boundary part between the semi-transmissive film and a light-shielding film steep. <P>SOLUTION: A multi-tone photomask including a light-shielding part shielding exposure light, a transmissive part transmitting the exposure light, and a semi-transmissive part transmitting a portion of the exposure light is prepared on the transparent substrate. Then, a transmitting zone having a width equal to or smaller than the resolution limit of an exposure apparatus is formed in the boundary of the light-shielding part and the semi-transmissive part. In a step for forming the transmitting zone, after forming the light-shielding part, the transmissive part and the semi-transmissive part, then the transmitting zone having a width equal to or smaller than the resolution limit of the exposure apparatus is formed in the boundary of a light-shielding film and a semi-transmissive film by zapping. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
