发明名称 |
EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To correct deviation in ejecting direction of liquid droplets of a target material in order to stabilize an EUV output of an EUV light source device. <P>SOLUTION: The extreme ultraviolet light source device includes: a liquid droplet generation device 110 by which liquid droplets 101 of the target material are output toward a preset plasma emission point 103; a charging device 130 by which the liquid droplets 101 of the target material are charged; a trajectory correction device 140 by which an electric field or an magnetic field is formed in a trajectory so that the advancing direction of the charged liquid droplets 101a of the target material is corrected so as to be directed to the plasma emission point 103, and a laser light source 150 which forms plasma by irradiating laser beams to the charged target material at the plasma emission point 103. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010062141(A) |
申请公布日期 |
2010.03.18 |
申请号 |
JP20090177822 |
申请日期 |
2009.07.30 |
申请人 |
KOMATSU LTD;GIGAPHOTON INC |
发明人 |
YANAGIDA TATSUYA;ENDO AKIRA;NAKANO MASANARI |
分类号 |
H05G2/00;H01L21/027 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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