| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern transfer apparatus equipped with a gap adjustment mechanism which enables precise and good transfer of a pattern by allowing setting of two gaps, a gap produced on adhesion/transfer and held by a simple mechanism, e.g. a web support formed with springs and a gap produced on peeling and held by a peeling roll. Ž<P>SOLUTION: The gap between a substrate to-be-transferred and a web is held constant by a web support composed of a pair of springs for gap adjustment arranged before and after the substrate to-be-transferred. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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