| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method capable of uniformizing the shape of a thin film all over the thin film foming area even when a thin film is formed on a substrate by use of a liquid drop discharge method such as an inkjet method. Ž<P>SOLUTION: In the thin film forming method, a thin film is formed by arranging liquid body 101 containing a thin film forming material on a plurality of compartment areas separated from one another by partition walls 20 formed on a substrate 9. In the method, before arranging the liquid body 101 in the plurality of compartment areas, a surface treatment is performed so as to improve the wettability, with respect to the liquid body 101, of the partition walls 20 located at the center H of the thin film foming area formed of a plurality of partition areas to be higher than the wettability, with respect to the liquid body 101, of the partition walls 20 located in the periphery area L of the thin film foming area. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
