发明名称 APPARATUS AND METHOD OF FORMING SEMICONDUCTOR DEVICES
摘要 An apparatus to form semiconductor devices includes an inner tube and an outer tube disposed to surround the inner tube. A plate is disposed at first open end of the inner tube to reduce variation between pressures at a first portion and a second portion inside the inner tube. The sum of areas of through-holes disposed on the plate is 10 to 60 percent of the entire area of the plate. The through-holes may include a first through-hole that is disposed at a central portion of the plate, and second through-holes disposed at an edge portion of the plate. The second through-holes are annularly arranged to surround the first through-hole.
申请公布号 US2010064970(A1) 申请公布日期 2010.03.18
申请号 US20090545983 申请日期 2009.08.24
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 PARK YOUNGSOO;AHN JUNGIL;KIM MYEONGJIN;CHA SANGYEOB;HWANG WANGOO;AN YOUNGSAM
分类号 H01L21/465 主分类号 H01L21/465
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