| 摘要 |
PURPOSE: A radiation pressure vacuum pump and an electronic beam vacuum pump are provided to effectively eliminate unnecessary gas particles which stick to the surface of a processed substrate of a nano-scaled precise process facility used in vacuum condition through a local apparatus using the radiation pressure or a material wave. CONSTITUTION: An electromagnetic wave generator using a visible light, laser, ultraviolet ray, or X-rays is installed in the inner side or the outer side of a sealed pipe. A vent for discharging gas particles is established in the opposite side of the electromagnetic wave generator. The gas particles within a vacuum pump(7) chamber are exhausted through a momentum transfer method using the radiation pressure of an electromagnetic wave photon. An electron generating source(1) which enables cold electron emission using a field effect and a line type filament facilitating thermionic emission are installed inside the sealed pipe. An electrode accelerates electrons and a vent is installed in the opposite side of the sealed pipe.
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