| 发明名称 |
EXPOSURE DEVICE, EXPOSURE SYSTEM AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily recognize the whole contents of a plurality of errors even when the plurality of errors occur. <P>SOLUTION: Processing concerned with exposure is carried out using a substrate. An exposure device includes a display device DP which displays a list of information on errors occurring in the processing concerned with the exposure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010062367(A) |
申请公布日期 |
2010.03.18 |
| 申请号 |
JP20080226994 |
申请日期 |
2008.09.04 |
| 申请人 |
NIKON CORP |
发明人 |
FUJIMA TOSHIHISA;MASUKO HISASHI |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
