Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source

摘要

Within a volume between a target surface and a substrate surface to be magnetron sputter coated the magnetron field pattern is formed in a circular closed loop having a radius-like extension towards a centre area of the circular closed loop. Thereby, the magnetron field arcs tunnel-like from an outer area of first magnetic pole (87 0 ) and a second inner area of second magnetic pole (87 2 '). An unbalanced long-range field pattern which is asymmetrical is generated by an increased magnetic flux along a distinct area (P), due to a sickle-like increase of the outer area (87 0 ). The magnetic field pattern is swept along the target surface by rotational movement about the axis of the circular closed loop.